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篇名 污染物特性與溶氧對UV/TiO[feaf]光催化程序之影響
卷期 26:1
並列篇名 Effects of Pollutant Characteristics and Dissolved Oxygen on the UV/TiO[feaf]Photocatalytic Process
作者 莊連春黃欣栩曾迪華林何印
頁次 49-60
關鍵字 UV/TiO[feaf]程序二氧化鈦吸附光解速率溶氧UV/TiO[feaf]processTitanium dioxideAdsorptionPhotodecomposition rateDissolved oxygen
出刊日期 200403

中文摘要

     本研究採用兩種TiO2光觸媒(Degussa P-25及Janssen)及兩種有機污染物(親水性的柳酸(SA)與親有機單氯苯(MCB)以探討光觸媒種類、污染物特性、pH值及溶氧量對UV/TiO2光催化程序之影響。研究首先量測污染物在光觸媒上之吸附動力及平衡數據。接著,量測在不同pH值或溶氧量下,氫氧自由基產生量及污染物之光解速率。另外,為了分析光解產物(氯離子)對光觸媒之毒化程度,研究過程亦使用X光光電子能譜儀(XPS)對光觸媒在反應前後其表面化學組成之變化進行鑑定。最後,經由結合吸附及光解催化數據,我們將對UV/TiO2光催化程序之反應機制及控制因子作一些初步之探討。

英文摘要

     Two TiO2 samples, Degussa P-25 and Janssen, and two organic compounds, salicylic acid (SA) and monochlorobenzene (MCB), were used to investigate the effects of TiO2 and pollutant characteristics, pH value, and dissolved oxygen on the UV/TiO2 photodecomposition process. The adsorption kinetics and equilibrium of both organic compounds on Degussa P-25 were first measured. Then, the hydroxyl radical concentration and the decomposition rates of organic compounds under different pH values and dissolved oxygen amounts were examined. Moreover, the poisoning effect of degradation products (C1) on the TiO2 samples was characterized with the XPS analysis of the changes of chemical component of TiO2 before and after reaction. Finally, the mechanism and controlling factors for the above photodecomposition process were deduced using the adsorption and reaction kinetics data.

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