二氧化鈦(Titanium dioxide,TiO2)薄膜已經廣泛應用於建築物的自潔玻璃(self-cleaning glass)，這一些玻璃透過紫外光的照射，可以分解大部分的有機複合物。由於二氧化鈦薄膜之表面粗糙度值會影響光觸媒效果，因此於運用二氧化鈦薄膜製作自潔玻璃製程中，量測二氧化鈦薄膜之表面粗糙度，成為重要之研究方向。傳統量測二氧化鈦薄膜表面粗糙度值方法為使用原子力顯微鏡(atomic force microscope, AFM)，然而此一方法之缺點為量測前之前置作業(lead time)時間長以及量測速度慢。為解決此問題，本研究發展出一套二氧化鈦薄膜表面粗糙度光學
檢測系統。研究結果顯示，量測角度60°為量測二氧化鈦薄膜表面粗糙度之最佳量測角度，y = 90.391x + 0.5123 為預測二氧化鈦薄膜表面粗糙度之趨勢方程式，二氧化鈦薄膜表面粗糙度值(y)，可藉由雷射光峰值功率密度(x)計算，二氧化鈦表面粗糙度值之最佳量測誤差率可控制在8.8% 之內，檢測時間節省效率高達83%。

Titanium dioxide (TiO2) thin films have been widely coated in the self-cleaning glass for facade application. The benefit of these glasses is its ability to actively decompose organic compounds with the help of ultraviolet light. Understanding the surface roughness of TiO2 thin films is important before manufacturing of self-cleaning glasses using TiO2 thin films because surface roughness of TiO2 thin films has highly significant influence on the photocatalytic performance. Traditional
approach for measuring surface roughness of TiO2 thin films is atomic force microscopy. The disadvantage of this approach include long lead-time and slow measurement speed. To solve this problem, an optical inspection system for rapid measuring the surface roughness of TiO2 thin films is developed in this study. It is found that the incident angle of 60° is a good candidate for measuring surface roughness of TiO2 thin films and y = 90.391x + 0.5123 is a trend equation for predicting the surface roughness of TiO2 thin films. Roughness average (Ra) of TiO2 thin films (y) can be directly determined from the peak power density (x) using the optical inspection system developed. The results were verified by white-light interferometer. The best measurement error rate of the optical inspection system developed can be controlled about 8.8%.The saving in inspection time of the surface roughness of TiO2 thin films is up to 83%.