文章詳目資料

防蝕工程 EIScopus

  • 加入收藏
  • 下載文章
篇名 酒石酸對碲化鉍銻溶液在循環伏安下之影響
卷期 28:1
作者 康菀珊李文錦林招松
頁次 039-044
關鍵字 碲化鉍銻循環伏安酒石酸過電位電鍍熱電材料Bismuth antimony tellurideCyclic voltammetryTartaric acidUnderpotential depositionThermoelectric materialsEI
出刊日期 201403

中文摘要

循環伏安檢測可分析溶液中物種的還原氧化特性’本實驗藉由此方法硏究碲化鉍銻水 溶液中單獨離子與混和溶液的氧化還原行爲,以及添加酒石酸錯合劑後對電化學性質的影 響。酒石酸爲增加銻離子於水溶液中溶解度必須的錯合劑,但添加過多的酒石酸會造成銻 離子的還原變得困難且還原電流下降,而酒石酸對於鉍離子與碲離子則無明顯影響。二元 與三元混和溶液的還原皆比單成分離子來的容易,說明此系統存在過電位電鍍的現象,三 元溶液呈現兩個還原峰,第一個可對應到碲化鉍的還原,第二個爲碲化銻的還原。

英文摘要

The redox properties of bismuth antimony telluride solutions, including the solely component, the mixed solution, and the effect of tartaric acid addition, were analyzed via cyclic voltammetry in this study. Tartaric acid can improve the solubility of Sb1!I in solutions, however, due to the strong complexing, too much tartaric acid results in reducing the reduction potential and lowering the reduction current of Sbm. The reduction potential of mixed solutions was more positive than solely component solutions owing to underpotential deposition. Ternary solution shows two reduction peaks in cyclic voltammogram, the first peak and the second peak can correspond to the reduction of bismuth telluride and antimony telluride,respectively.

相關文獻