在本文中，我們以自行架設的鈦藍寶石飛秒雷射，在負光阻SU8以及正光阻AZ4620中進行雙（多）光子曝光。利用雙（多）光子吸收光聚合化技術，我們成功地證實了此技術可以用來製作一維、二維和三維的微奈米週期性結構，並經由程式路徑規劃，可以加入任意的缺陷結構於週期性結構中。為了增加光子晶體的反射率，藉由電化學沉積技術，在雙光子曝光的模板中，沉積出高折射率的硒化鎘二維結構，再將高分子移除，用以增加折射率的對比，進而增加光子晶體的能隙寬度。

In this report, a home-made Ti: sapphire femto-second laser was used as a light source to carry out two-photon (or multi-photon) polymerization on negative-tone SU8 and positive-tone AZ4620 photoresists. Using this technique we successfully fabricated one-, two-, and three-dimensionally periodic structures. Arbitrary types of defects can be introduced in these structures by arranging the exposed positions which were controlled by computer programs. To increase the index of refraction of photonic crystals, we used electric-deposition technique to deposit two-dimensional CdSe structures of a high refractive index on photoresist patterned substrates. Photoresists were then removed to increase the refractive index contrast to broaden the photonic bandgaps of photonic crystals.