篇名 | Ultrastructural Study of X-ray Irradiated Spores of Equisetum Arvense L. |
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卷期 | 43:3、43:3 |
並列篇名 | 問荊孢子經X射線照射後之微細構造研究 |
作者 | Kedves,M. 、 Pardutz,A. |
頁次 | 215-224 |
關鍵字 | 問荊孢子 、 微細構造 、 X射線效應 、 Equisetum spore 、 Ultrastructure 、 X-ray effect 、 Scopus 、 TSCI 、 SCIE |
出刊日期 | 199809 |
以X射線照射問荊(Equisetum arvense L.)之孢子各5秒、15秒、30秒或60秒後,利用穿透式電子顯微鏡觀察其孢子壁與原生質微細構造之變化。結果發現,問荊之外孢子對於X射線的抗力較對二乙胺有機溶劑的抗力大,而孢子壁的分子結構亦可藉由X射線照射顯現出來。由本研究可知,孢子壁各層次對於放射線及有機溶劑的抗性表現不同,故可藉此瞭解孢粉質的生物多聚體系統構造。
Fresh spores of Equisetum arvense L. were irradiated for 5s, 15 5s. 30s or 60s, and examined with a transmission electron microscope. Alterations to the fine structure of the spore wall and the protoplasm are described. The exospore was more resistant to X-ray irradiation than to organic solvents, in particular diethylamine. The molecular structure of the spore wall was revealed by the X-ray effect. Resistance of the different layers of the sporomorphs to irradiation and organic solvents is important for understanding the complicated biopolymer system of the sporopollenin.