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篇名 掃描電位顯微鏡於銅銦鎵硒薄膜分析之應用
卷期 35:5=199
並列篇名 Applications of Scanning Kelvin Probe Microscopy on the Analysis of Cu(In,Ga)Se2 Thin Films
作者 唐瑋鍾林偉聖張仁銓謝東坡張茂男
頁次 057-065
出刊日期 201406

中文摘要

本文介紹表面電位分析於探討影響銅銦鎵硒 (CuIn1xGaxSe2, CIGS) 太陽能電池短路電流 (short-circuitcurrent, Jsc) 因素之應用。針對三階段共蒸鍍 (three-stage co-evaporation process) 成長的銅銦鎵硒薄膜,以掃描電位顯微鏡 (scanning kelvin probe microscopy, SKPM) 取得銅銦鎵硒薄膜的表面電位縱深分布,再搭配 X 光光電子能譜儀 (x-ray photoelectron spectroscopy, XPS) 提供的銅銦鎵硒元素縱深分布輪廓,可藉以分析表面電位變化與銅銦鎵硒薄膜能隙以及內建電場的關係,並進一步探討影響元件短路電流的因素。

英文摘要

This article introduces the applications of surface potential analysis on investigating the factors influencing theshort-circuit current of a CIGS solar cell. For the CIGS thin fi lm grown by a three-stage co-evaporation process, weemployed scanning Kelvin probe microscopy (SKPM) to obtain the depth distribution of the surface potential ofa CIGS thin fi lm. With the elemental depth profi les provided by X-ray photoelectron spectroscopy (XPS), one canstudy the relation between the surface potential variations and the energy gaps as well as the built-in electric fi eld ina CIGS thin fi lm. Furthermore, the factors infl uencing the short-circuit current of a CIGS solar cell can be studied.

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