金屬矽化物為為一重要材料系統，現今金屬矽化物薄膜為積體電路元件不可或缺的一部份；近年來，低維奈米尺寸金屬矽化物，由於其在介面反應基本了解以及多元應用的重要性，備受矚目。本文介紹金屬矽化物薄膜以及低維奈米結構金屬矽化物發展概況，而以應用電子顯微鏡所獲致的成果為主要範例。由於金屬矽化物深具前瞻應用的潛力，可預見未來仍為研發重點，電子顯微鏡也自然會在這項研究上繼續扮演關鍵的重要角色。

Metal silicide thin fi lms have been an integral part of integrated circuits. In recent years, increasing attention has been directed to the low dimensional metal silicide systems owing to their importance in enhancing fundamental understanding of the interfacial reactions between metal and silicon as well as in a variety of applications. In this article, a brief introduction is made with particular emphasis on the applications of electron microscopy to the metal silicide research. With the vast potential for the novel and practical applications of metal silicides, continuing and vigorous efforts in research with electron microscopy playing a vital part are foreseen.