雙圖樣微影技術在製程當中，必須分別做兩次不同的曝光及硬遮罩蝕刻。而決定各個矩形(shape)分別屬於哪一個光罩的範圍則是整個技術的主軸。通常雙圖樣微影技術的問題可以轉換為使用兩種顏色的塗色問題。在決定好各個矩形的顏色之後，可以清楚知道：相同的顏色代表是同一層的光罩。本論文中我們開發一雙塗色演算法使矩形的顏色分佈比例趨近一致，進而達到色彩平衡並符合雙圖樣微影技術的製程要求。

In double patterning processing, it must do twice different exposure step and hardmask etch. Moreover, how to decide each shape is belonging to which hard-mask is the kernel problem of this technology. In this paper, we turn this double patterning problem into 2-coloring problem. Furthermore, we show that the shapes with identical color is representing the same hard-mask. We make the distribution of two colors to be as balanced as possible, in order to achieve color balancing and the demands of double patterning technology.